kirsten Moselund

IS01–Scaled III-V optoelectronic devices on silicon

Tiwari P., Mauthe S., Vico Trivino N., Staudinger P., Scherrer M., Wen P., Caimi D., Sousa M., Schmid H., Ding Q., Schenk A., Moselund K. E.

In the present talk we discuss the development of the epitaxial technique Template-Assisted Selective Epitaxy (TASE) and its application for the monolithic integration of scaled III-V active photonic devices on silicon. A unique advantage of TASE for silicon photonics applications is that it enables a truly local integration of III-V material at precisely defined positions, […]